Draw chemistry and reaction mechanisms that show electron movement for the following:

a) why poly(1,4-xylylene) has relatively low resistance to chain scission arising from oxidative processes

b) why poly(but-1-ene-3-one) is susceptible to chain scission via the Norrish Type II process on expsoure to UV radiation whereas poly(2-methylbut-1-ene-3-one) is not susceptible to this reaction

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